ISO TS 80004-8:2013 pdf free

ISO TS 80004-8:2013 pdf free.Nanotechnologies一Vocabulary一Nanomanufacturing processes
method in which a scanning tip is used to transfer specific material onto a substrate surface, via a solvent meniscus, for patterning a substrate at length scales below 100 nm
Note 1 to entry: Often the tip is an AFM tip coated with specific molecules that are to be deposited on the surface in a layer that can be a monolayer. In other cases, the material to be deposited could be nanoparticles (2.6).
Note 2 to entry: “Dip-Pen Nanolithography” is the trade name of a product supplied by Nanolnk Inc. This information is given for the convenience of users of this document and does not constitute an endorsement by ISO of the product named. Equivalent products may be used if they can be shown to lead to the same results.[SOURCE: ISO 18115-2:2010, 6.40]
process in which a pattern is transferred by pressing a nanoscale (2.7) template (usually called a die,stamp, mask or mould] of the desired pattern in relief into a deformable resist, which is then cured thermally or with light
Note 1 to entry: As the pattern is defined by the topography of the template it is a printing process and not a primary lithography (3.6).
Note 2 to entry: Types of nano-imprint lithography are conveniently divided by the use of a particular type of resist for imprinting. With thermoplastic polymeric materials, the resist is heated so that it can flow when the pressure is applied to the template. With thermosetting resists, heat is applied after the initially liquid resist has been displaced by the template. Negative photosensitive resists can be set by the application of light though the (transparent in this case) template. Processes using photosensitive resist are called by different workers, optical imprinting, optical nano-imprinting or step and flash.
process in which the primary pattern is defined by the replication of a pattern that occurs in nature
EXAMPLE The stripes that occur on collagen fibres or the pattern formed by strands of RNA. The term refers to the use of a mask or template that does not require the use of a focused beam of radiation to define the pattern.[2]
process in which electromagnetic radiation is used to transfer a mask through a reticle to create a pattern
Note 1 to entry: Usually a resist material is used to make the mask.ISO TS 80004-8 pdf free download.